Van Zant distinguishes between epitaxy (growing a crystalline layer matching the substrate), CVD (Chemical Vapor Deposition) for dielectrics like silicon dioxide, and PVD (Physical Vapor Deposition) for metals like copper or aluminum. He emphasizes that deposition must be conformal—covering vertical sidewalls as evenly as horizontal surfaces—to prevent voids.
: Explains science basics like crystal growth and material properties of silicon. Fabrication Stages microchip fabrication peter van zant pdf